IViR is pleased to invite you to the launch of the book:
Fashion and Intellectual Property
ed. David Tan, Jeanne C. Fromer and Dev S. Gangjee,
Cambridge University Press, 2025.
ISBN: 9781009519618
Fashion is a multi-billion-dollar global business, which is not surprising because of our basic need to wear clothes and shoes. The fashion system thrives on ephemerality, novelty, seduction and hedonism. There are countless books on intellectual property law, numerous books on fashion theory, and a few books on fashion law, but hardly any on fashion and intellectual property. This book assembles a constellation of some of the best-known intellectual property scholars around the world to present their analysis of how different aspects of intellectual property laws interact with and regulate the fashion industry. It presents a meticulously curated collection of how intellectual property laws interact with contemporary fashion and culture studies in protecting fashion creations that range from clothing and footwear to textiles. It covers key features of intellectual property rights regimes in the United States, United Kingdom, Europe, Australia, and Asia that include copyright, trademarks, patents and geographical indications.
This title is also available open access on Cambridge Core.
| Programme | |
|---|---|
| 17:15-17:30 | Welcome coffee and tea |
| 17:30-17:50 | Introduction of the book by Prof. David Tan (National University of Singapore) |
| 17:50-18:10 | Discussion of book contents: • Prof. Jeanne Fromer (New York University) • Prof. Dev Gangjee (University of Oxford) • Prof. Martin Senftleben (IViR, University of Amsterdam) • Prof. Peter Yu (Texas A & M University, U.S.) |
| 18:10-18:30 | Q&A with the audience (onsite and via Zoom) |
Practical details:
Date: 21 May 2026
Time: 17:15 – 18:30 CET (Amsterdam)
Place:
– Institute for Information Law, Room A5.24, Roeterseilandcampus, Nieuwe Achtergracht 166, 1018 WV Amsterdam.
– Online via Zoom (you will receive the Zoomlink via e-mail before the event).
See also the flyer.
Please register your attendance in the form below: